High throughput method for K0.5Na0.5NbO3 thin films preparation by chemical solution deposition

A high throughput method for synthesis and characterization of ferroelectric thin film libraries prepared by chemical solution deposition was developed. With a throughput of over 100 samples of different composition/day, it is possible to screen vast composition fields in a manageable amount of time. The method was applied to films of the binary KNbO3–NaNbO3 system. Structured Pt/SiO2/Si wafers were used as substrates. Samples of 450 nm thickness with remarkable dielectric properties and pure perovskite phases were obtained by optimizing the composition with respect to the K/Na-ratio, and by identifying the ideal amount of alkali-metal excess added to the precursor solutions.