کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1478308 | 1510149 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Precise measurement of the dielectric properties of BaxSr1âxTiO3 thin films by on-wafer through-reflect-line (TRL) calibration method
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Polycrystalline BaxSr1âxTiO3 (x = 0.3, 0.4, 0.5) (BST) thin films with a thickness of 200 nm were deposited on r-cut sapphire substrates by rf sputtering method. The permittivity and loss tangent of the films were successfully observed in the range of 1-3 GHz, by utilizing the on-wafer through-reflect-line (TRL) calibration method although the estimated relative permittivity depended on an applied power to waveguides and the loss tangent had the dispersion around 1 GHz even in the case of 2 μm-thick aluminum. Finally, we concluded that the BST thin film with x = 0.4 is the most suitable for microwave tunable devices because it had the lowest loss tangent and relatively high permittivity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of the European Ceramic Society - Volume 26, Issues 10â11, 2006, Pages 1835-1839
Journal: Journal of the European Ceramic Society - Volume 26, Issues 10â11, 2006, Pages 1835-1839
نویسندگان
G. Bhakdisongkhram, S. Okamura, T. Shiosaki,