Composition-density and refractive index relations in PECVD silicon oxynitrides thin films

SiOxNy thin films have been prepared by the Plasma Enhanced Chemical Vapour Deposition (PECVD). From the information acquired by XPS for the composition, ellipsometry for the refractive index and grazing X-rays reflectometry for the density, it is possible to establish a relation between these three characteristics of the layer from the Bruggeman and Clausius-Mossoti equations.