کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1480885 | 1510441 | 2014 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
X-ray absorption spectroscopy of Cu-doped WO3 films for use in electrochemical metallization cell memory
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: X-ray absorption spectroscopy of Cu-doped WO3 films for use in electrochemical metallization cell memory X-ray absorption spectroscopy of Cu-doped WO3 films for use in electrochemical metallization cell memory](/preview/png/1480885.png)
چکیده انگلیسی
• Cu-doped WO3 films were prepared by DC magnetron sputtering.
• Local atomic and electronic structure was studied by X-ray absorption spectroscopy.
• In the as-prepared samples copper is mostly present in the metallic phase.
• Copper ions transfer into Cu+ upon annealing at 135 °C.
We have performed the first synchrotron radiation X-ray absorption spectroscopy (EXAFS/XANES) study of the local atomic and electronic structure around Cu and W ions in WO3/Cu/WO3/Si and WO3/Cu/Si multilayered structures, aimed for the application in the electrochemical metallization cell memory. The influence of low-temperature annealing at 135 °C has been investigated in details, and a structural model of Cu-doped WO3 films is proposed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 401, 1 October 2014, Pages 87–91
Journal: Journal of Non-Crystalline Solids - Volume 401, 1 October 2014, Pages 87–91
نویسندگان
A. Kuzmin, A. Anspoks, A. Kalinko, J. Timoshenko, R. Kalendarev,