کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1486736 1510565 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of methane gas on the properties of nitrogenated amorphous carbon films grown by surface wave microwave plasma CVD
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Effect of methane gas on the properties of nitrogenated amorphous carbon films grown by surface wave microwave plasma CVD
چکیده انگلیسی

We have studied the influence of the methane gas (CH4) pressure on the surface morphology, composition, structural and electrical properties of nitrogenated amorphous carbon (a-C:N) films grown by surface wave microwave plasma chemical vapor deposition (SWMP-CVD) using Scanning electron microscopy (SEM), Atomic force microscopy (AFM), Auger electron spectroscopy (AES), X-rays photoelectron spectroscopy (XPS), UV-visible spectroscopy and 4-point probe resistance measurement. We have succeed to grow a-C:N films using a novel method of SWMP-CVD at room temperature and found that the surface morphology, bonding, optical and electrical properties of a-C:N films are strongly dependent on the CH4 gas sources and the a-C:N films grown at higher CH4 gas pressure have relatively high electrical conductivity.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 351, Issues 30–32, 1 September 2005, Pages 2562–2567
نویسندگان
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