کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1493444 | 1510784 | 2015 | 8 صفحه PDF | دانلود رایگان |
• Porous silica ridge waveguide MR has been implemented using standard photolithography process.
• The experimental coupling ratio well corresponds to the theoretical one.
• A very promising theoretical sensitivity of 1170 nm per refractive index unit has been calculated.
The fabrication of micro-resonators, made from porous silica ridge waveguides by using an electrochemical etching method of silicon substrate followed by thermal oxidation and then by a standard photolithography process, is reported. The design and fabrication process are described including a study of waveguide dimensions that provide single mode propagation and calculation of the coupling ratio between a straight access waveguide and the racetrack resonator. Scanning electronic microscopy observations and optical characterizations clearly show that the micro-resonator based on porous silica ridge waveguides has been well implemented. This porous micro-resonator is destined to be used as an optical sensor. The porous nature of the ridge waveguide constitutes the detection medium which will enhance the sensor sensitivity compared to usual micro-resonators based on the evanescent wave detection. A theoretical sensitivity of 1170 nm per refractive index unit has been calculated, taking into consideration experimental data obtained from the optical characterizations.
Journal: Optical Materials - Volume 50, Part B, December 2015, Pages 167–174