کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1494045 | 1510796 | 2014 | 7 صفحه PDF | دانلود رایگان |
• Yb/Al-codoped fused-silica (FS) waveguides for high-power integrated-optics are developed.
• No process reported for simultaneous dry-etching of silica matrix and Al constituent.
• Inductively-coupled plasma (ICP) deep-etching by alternating BCl3 and CF4 is reported.
• Heat buildup during high-density ICP etching of thermally isolating FS was mitigated.
• Preliminary optical measurements show 1 dB/cm loss for 20 × 33 μm waveguide at 1030 nm.
A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.
Journal: Optical Materials - Volume 38, December 2014, Pages 265–271