کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1496430 | 992963 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of biaxial stresses in diamond films deposited on a silicon substrate by the HF CVD method
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Investigation of biaxial stresses in diamond films deposited on a silicon substrate by the HF CVD method Investigation of biaxial stresses in diamond films deposited on a silicon substrate by the HF CVD method](/preview/png/1496430.png)
چکیده انگلیسی
The results of investigations into on composition and biaxial stress in polycrystalline diamond films deposited on silicon substrates are presented. The diamond films' characteristics were carried out using Raman spectroscopy and Electron back-scattered diffraction. The results indicate that, apart from the dominating crystalline diamond phase inside the grains, an amount of disordered phase exists among the grains. No evidence of such diamond polymorphs as lonsdalite and graphite has been detected in the investigated films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optical Materials - Volume 30, Issue 5, January 2008, Pages 770-773
Journal: Optical Materials - Volume 30, Issue 5, January 2008, Pages 770-773
نویسندگان
G.W. BÄ
k, K. Fabisiak, L. Klimek, M. Kozanecki, E. Staryga,