کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1499616 | 993314 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Quantitative X-ray microtomography study of 3-D void growth induced by electromigration in eutectic SnPb flip-chip solder joints
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
Vacancy flux in eutectic flip-chip SnPb solder joints driven by electromigration was studied using synchrotron radiation X-ray microtomography technique. The change in void volume and shape in three-dimensional images was measured quantitatively and the product of diffusivity and effective charge number of electromigration in eutectic SnPb alloy was calculated to be 3.3 × 10−9 and 9.5 × 10−9 cm2 s−1 at 100 and 120 °C, respectively. The activation energy of the effective self-diffusivity in SnPb alloy was measured to be 0.66 eV.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 65, Issue 7, October 2011, Pages 646–649
Journal: Scripta Materialia - Volume 65, Issue 7, October 2011, Pages 646–649
نویسندگان
Tian Tian, Kai Chen, A.A. MacDowell, Dula Parkinson, Yi-Shao Lai, K.N. Tu,