کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1499616 993314 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Quantitative X-ray microtomography study of 3-D void growth induced by electromigration in eutectic SnPb flip-chip solder joints
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Quantitative X-ray microtomography study of 3-D void growth induced by electromigration in eutectic SnPb flip-chip solder joints
چکیده انگلیسی

Vacancy flux in eutectic flip-chip SnPb solder joints driven by electromigration was studied using synchrotron radiation X-ray microtomography technique. The change in void volume and shape in three-dimensional images was measured quantitatively and the product of diffusivity and effective charge number of electromigration in eutectic SnPb alloy was calculated to be 3.3 × 10−9 and 9.5 × 10−9 cm2 s−1 at 100 and 120 °C, respectively. The activation energy of the effective self-diffusivity in SnPb alloy was measured to be 0.66 eV.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 65, Issue 7, October 2011, Pages 646–649
نویسندگان
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