کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1500066 993332 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The preferred facet orientation of GaAs pyramids for high-quality InAs and InxGa1−xAs quantum dot growth
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
The preferred facet orientation of GaAs pyramids for high-quality InAs and InxGa1−xAs quantum dot growth
چکیده انگلیسی

The energetically favorable facet orientation of GaAs pyramids for InAs quantum dot (QD) growth was studied in terms of a crystallographic matching perspective. The predicted apparent interface is (5.6 1 1)GaAs, which agrees well with the best substrate (5 1 1)GaAs in previous experimental observations. This allows close-packed planes, (1 1 1)InAs and (1¯11)GaAs, with their edges meeting at the interface. The dependence of preferred facet orientation on the indium ratio of InxGa1−xAs QDs is also studied, which provides a new way to fabricate high-quality InxGa1−xAs QDs.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 64, Issue 7, April 2011, Pages 681–684
نویسندگان
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