Hydrogen absorption kinetics of Mg thin films under mild conditions

A series of Pd–Mg thin films with various thicknesses of Mg were prepared by magnetron sputtering. Their thickness-dependent hydrogen absorption kinetics in the temperature range 298–338 K was investigated by modeling the resistance. The hydrogen diffusion in MgH2 films was investigated by electrochemical measurements. We discuss the dominating factor of the absorption kinetics and the critical thickness of the passivating MgH2 layer, as well as the requirements for the advanced hydrogen storage materials under mild conditions.