کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1501174 | 993373 | 2010 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effect of residual hydrogen on hydrogenation behavior of titanium thin films
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered titanium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti–H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress–concentration curves.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 62, Issue 9, May 2010, Pages 709–712
Journal: Scripta Materialia - Volume 62, Issue 9, May 2010, Pages 709–712
نویسندگان
E. Tal-Gutelmacher, A. Pundt, R. Kirchheim,