کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1502343 993416 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Further considerations on the high-cycle fatigue of micron-scale polycrystalline silicon
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Further considerations on the high-cycle fatigue of micron-scale polycrystalline silicon
چکیده انگلیسی

Bulk silicon is not susceptible to high-cycle fatigue but micron-scale silicon films are. Using polysilicon resonators to determine stress-lifetime fatigue behavior in several environments, oxide layers are found to show up to four-fold thickening after cycling, which is not seen after monotonic loading or after cycling in vacuo. We believe that the mechanism of thin-film silicon fatigue is “reaction-layer fatigue”, involving cyclic stress-induced thickening of the oxide and moisture-assisted cracking within this layer.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 59, Issue 9, November 2008, Pages 931–935
نویسندگان
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