In situ X-ray diffraction analysis on the crystallization of amorphous Ti-Ni thin films

Crystallization behaviors of amorphous Ti-Ni thin films were investigated by means of in situ X-ray diffraction measurements within the temperature interval 420-450 °C. The results showed that crystalline Ti-Ni thin films displayed (1 1 0) preferential orientation. Analysis of the crystallization kinetics yielded Avrami exponents in the range 2.0-2.4 and an activation energy of 358.1 kJ/mol. A site-saturation nucleation mechanism is proposed for the crystallization of amorphous Ti-Ni thin films.