کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1502760 993433 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structures and nanoindentation properties of nanocrystalline and amorphous Ta–W thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Structures and nanoindentation properties of nanocrystalline and amorphous Ta–W thin films
چکیده انگلیسی

The microstructures and mechanical properties of Ta–W thin films sputter-deposited at two substrate temperatures, 298 and 773 K, were investigated. Whereas the 298 K sample was crystalline, the 773 K sample had an amorphous structure. Hardness and Young’s modulus of the nanocrystalline Ta–W thin film were determined to be 14.29 and 181.73 GPa, respectively. These values are ∼20 and 10% lower than those measured from the amorphous counterpart.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 58, Issue 3, February 2008, Pages 195–198
نویسندگان
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