کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1503523 | 993482 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Phase stability of hafnium oxide and zirconium oxide on silicon substrate
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Phase stability of hafnium oxide and zirconium oxide on silicon substrate Phase stability of hafnium oxide and zirconium oxide on silicon substrate](/preview/png/1503523.png)
چکیده انگلیسی
Phase stabilities of Hf–Si–O and Zr–Si–O have been studied with first-principles and thermodynamic modeling. From the obtained thermodynamic descriptions, phase diagrams pertinent to thin film processing were calculated. We found that the relative stability of the metal silicates with respect to their binary oxides plays a critical role in silicide formation. It was observed that both the HfO2/Si and ZrO2/Si interfaces are stable in a wide temperature range and silicide may form at low temperatures, partially at the HfO2/Si interface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 57, Issue 3, August 2007, Pages 201–204
Journal: Scripta Materialia - Volume 57, Issue 3, August 2007, Pages 201–204
نویسندگان
Dongwon Shin, Zi-Kui Liu,