کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1503596 | 993489 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of film thickness and annealing temperature on hillock distributions in pure Al films
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
The dependence of hillock distribution on film thickness and annealing temperature has been studied in pure aluminum films. The densities and diameters of hillocks were analyzed after 6 h of annealing. As the film thickness increases, the hillock density decreases and the average diameter increases. The total volume of hillocks per unit area of the film increases linearly with both the film thickness and the annealing temperature. Using a model based on stress relaxation, a simple equation which can predict the hillock density and average hillock diameter is suggested.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 56, Issue 1, January 2007, Pages 17–20
Journal: Scripta Materialia - Volume 56, Issue 1, January 2007, Pages 17–20
نویسندگان
Soo-Jung Hwang, Je-Hun Lee, Chang-Oh Jeong, Young-Chang Joo,