کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1504127 1510974 2015 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Hexagonal nanosized molybdenum diselenide thin film deposited at 333 K by chemical method
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Hexagonal nanosized molybdenum diselenide thin film deposited at 333 K by chemical method
چکیده انگلیسی


• we deposited nanocrystalline MoSe2 thin film at 333 K using citric acid.
• The obtained nanocrystalline MoSe2 is semiconducting and hexagonal structure.
• Deposited nanocrystalline MoSe2 shows blue shift.
• This material is suitable for solar cell and opto-electronic devices.

Molybdenum diselenide thin films have been deposited on to stainless steel and glass substrates by the chemical process, using ammonium molybdate, sodium selenosulphite as a precursor sources and citric acid was used as a complexing agent. The structural and optical properties of the deposited films have been studied using X-ray diffraction and optical absorption techniques, respectively. XRD studies reveal that the films are polycrystalline with hexagonal crystal structure. Optical absorption study shows the presence of direct transition with band gap energy 1.51 eV. EDAX analysis shows that the films are nearly stoichiometry of Mo: Se: 1:2. The configuration of fabricated cell is n-MoSe2 | NaI (2 M) + I2 (1 M) | C (graphite) yielded a conversion efficiency of 1.08%.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Sciences - Volume 48, October 2015, Pages 19–22
نویسندگان
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