Magnetic characteristics of nanocrystalline GaMnN films deposited by reactive sputtering

The magnetic characteristics of Ga1−xMnxN nanocrystalline films (x = 0.08 and x = 0.18), grown by reactive sputtering onto amorphous silica substrates (a-SiO2), are shown. Further than the dominant paramagnetic-like behaviour, both field- and temperature-dependent magnetization curves presented some particular features indicating the presence of secondary magnetic phases. A simple and qualitative analysis based on the Brillouin function assisted the interpretation of these secondary magnetic contributions, which were tentatively attributed to antiferromagnetic and ferromagnetic phases.

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► Nanocrystalline GaMnN films with high Mn content were grown by reactive sputtering.
► High sensitive SQUID magnetometry characterization was performed.
► Paramagnetism is the dominant magnetic behaviour.
► Secondary magnetic phases are associated to the nanocrystalline structure.