Low-temperature, solution processing of TiO2 thin films and fabrication of multilayer dielectric optical elements

High-quality TiO2 thin films have been deposited from aqueous titanium-peroxo solutions via spin coating. The effects of precursor solution pH on the crystallization behavior, morphology, density, and refractive index of the films are reported. From X-ray diffraction measurements, the amorphous as-deposited films are found to crystallize in the anatase phase at 250 °C. Surface and cross-section SEM images reveal that films deposited from an acidic precursor are more uniform and denser than those deposited from a basic precursor. X-ray reflectivity measurements show that films with smooth surfaces and high densities (up to 87% of single-crystal anatase) can be produced at temperatures as low as 300 °C. Measured densities are consistent with high refractive indices at 633 nm of 2.24 and 2.11 for films derived from acidic and basic precursors, respectively. The uniformity and dense nature of the films have allowed fabrication of multilayer dielectric optical elements with thermal processing at only 300 °C. The distributed Bragg reflector with four bilayers exhibits a reflectance of 92% and a stop band width of 150 nm. The optical microcavity has a quality factor of 20. The optical properties of all elements agree well with theoretical models, indicating good optical quality. Use of the precursor chemistry for direct photopatterning of TiO2 films without a polymer resist is also demonstrated.

Figure optionsDownload as PowerPoint slide