Capacitance–voltage and conductance–voltage characteristics of Ag/n-CdO/p-Si MIS structure prepared by sol–gel method

The frequency dependent electrical properties of Ag/n-CdO/p-Si structure has been investigated using capacitance–voltage (C–V) and conductance–voltage (G/ω–V) characteristics in the frequency range 10 kHz–1 MHz in the room temperature. The increase in capacitance at lower frequencies is observed as a signature of interface states. The presence of the interfaces states (NSS) is also evidenced as a peak in the capacitance–frequency characteristics. Furthermore, the voltage and frequency dependence of series resistance were calculated from the C–V and G/ω–V measurements and plotted as functions of voltage and frequency. The distribution profile of RS–V gives a peak in the depletion region at low frequencies and disappears with increasing frequencies. The values of interface state densities and series resistance from capacitance–voltage-frequency (C–V-f) and conductance–voltage-frequency (G/ω–V-f) measurements were obtained in the ranges of 1.44×1016–7.59×1012 cm−2 eV−1 and 341.49–8.77 Ω, respectively. The obtained results show that the C–V-f and G/ω–V-f characteristics confirm that the interface states density (NSS) and series resistance (RS) of the diode are important parameters that strongly influence the electrical parameters in Ag/n-CdO/p-Si structures.

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► Nanocluster-CdO thin films were prepared using sol–gel spin coating method.
► Measurements were performed in the frequency range of 10 kHz–1 MHz in the room temperature.
► Frequency dependence of interface states density was obtained using Hill–Coleman method.
► Obtained results show that C–V and G/ω–V characteristics strongly depend on the frequency.