کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1516266 1511543 2013 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of sulfur additive on density of localized states in nanostructures chalcogenide Se95−xSxZn5 thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Effect of sulfur additive on density of localized states in nanostructures chalcogenide Se95−xSxZn5 thin films
چکیده انگلیسی
This paper reports the measurement of space charge limited conduction (SCLC) on the fabricated thin films of Se95−xSxZn5 (0.2≤x≤10) in temperature range 313-353 K for the first time. At high electric fields (E∼104 V/cm), the current could be fitted into the theory of space charge limited conduction, in case of uniform distribution of localized states in mobility gap. The homogeneity and surface morphology of thin films were assessed by scanning electron microscopy. The crystalline nature of the thin films was confirmed by powder XRD and the crystallite size was calculated using Scherer's formula. The crystallite size and density of localized states were found to increase with the increase of sulfur concentration. DC conductivity and activation energy were calculated and found to decrease and increase respectively, with the increase of sulfur concentration.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Physics and Chemistry of Solids - Volume 74, Issue 11, November 2013, Pages 1527-1532
نویسندگان
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