Effect of annealing on structural and electrical properties of the Li–Mn–O thin films, prepared by high frequency RF magnetron sputtering

Li–Mn–O thin film cathode materials are prepared by high frequency (27.12 MHz) RF magnetron sputtering. The high RF frequency gives higher deposition rates without compromising on the quality of the films. This investigation focuses on the effects of post-annealing on the micro-structural, morphological and electrical properties of Li–Mn–O films. It is observed that with the increase of annealing temperature the crystallinity as well as the electrical conductivity of the films increases. The films annealed at 600–700 °C are found to have high structural perfection and good electrical properties.

► Li–Mn–O thin film cathode materials prepared by high frequency (27.12 MHz) RF magnetron sputtering.
► High RF frequency gives higher deposition rate without compromising on the quality of the films.
► Effects of post-annealing on the micro-structural, morphological and electrical properties of Li–Mn–O films studied.
► As annealing temperature increases, crystallinity and the electrical conductivity of the films also increase.