Photoelectrochromic properties of NiO film deposited on an N-doped TiO2 photocatalytical layer

N-doped TiO2 film was synthesized on indium–tin oxide (ITO) conducting glass substrate by the hydrolysis method and characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Then high porous NiO was deposited onto the TiO2−xNx layer by chemical bath deposition (CBD) to prepare a double-layer TiO2−xNx/NiO electrode. The photoelectrochromic properties of the TiO2−xNx/NiO electrode were discussed through the results of UV–vis transmittance spectra, cyclic voltammogram and photocurrent transient measurements. It was found that the TiO2−xNx/NiO electrode was sensitive to light and exhibited a noticeable photoelectrochromism. The NiO film changed its color from colorless to brown, and the transmittance varied from 86.8% to 14.5% at 500 nm after 1 h irradiation.