Some features of chalcohalide glassy Ge-S-AgI thin films

Stress measurements of the thin films deposited on special silicon cantilevers were performed in a period of 3 months and the relation between AgI content and stress was defined. In addition, the compositional dependence of the stress relaxation of the studied glassy Ge-S-AgI coatings was elucidated and the most probable reasons for the stress formation were proposed.