کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1523066 | 1511825 | 2012 | 5 صفحه PDF | دانلود رایگان |
Investigations of the electron structure and phase composition of the surface layers in porous silicon with a developed system of nanopores were made with the use of ultrasoft X-ray spectroscopy and X-ray photoelectron spectroscopy. The samples of porous silicon were obtained on the substrates with p-type conductivity under different modes of electrochemical etching. Porous surface layer represents a system of weakly connected pores oriented mainly perpendicular to the surface of silicon wafer. The mean transverse pore dimension is of ∼50 nm. Silicon dioxide and sub-oxide were found in porous layer. We assume that these phases cover pores surface thus providing a possibility of the use of the structures as nanoreactors.
► Nanoporous silicon layers were obtained.
► A system of weakly connected pores was detected.
► Electron structure and phase composition of the surface layers in porous silicon were investigated.
Journal: Materials Chemistry and Physics - Volume 135, Issues 2–3, 15 August 2012, Pages 293–297