A comparison of Ar ion implantation and swift heavy Xe ion irradiation effects on immiscible AlN/TiN multilayered nanostructures

► 200 keV Ar and 166 MeV Xe irradiation effects on AlN/TiN multilayers were compared. ► The multilayered structures remained unmixed due to their immiscibility. ► Contributions of atomic collisions and electronic excitations were distinguished. ► Temperature distribution was evaluated and compared to the induced effects. ► The results can be interesting towards developing radiation tolerant materials.