Preparation of Ba–Ti–O films by laser chemical vapor deposition

Ba–Ti–O films were prepared on Pt-coated Si substrate by laser chemical vapor deposition, and their orientations and microstructures were compared. Ba2TiO4, BaTiO3, BaTi2O5, Ba4Ti13O30 and BaTi4O9 single-phase films were prepared at Ti to Ba molar ratio from 0.41 to 3.49. The α′-Ba2TiO4 film showed (0 1 0) and (0 9 1) co-orientation with elongated, truncated columnar grains. The BaTiO3 film was composed of triangular and hexagonal grains with slight (1 1 1) orientation. The BaTi2O5 film had (0 1 0) orientation and faceted columnar grains. The Ba4Ti13O40 film showed (1 0 0) and (0 1 2) co-orientation with shellfish-like grains. The BaTi4O9 film showed (0 1 0) orientation with slightly rounded faceted columnar grains. The deposition rates of Ba–Ti–O films ranged from 30 to 144 μm h−1.

► Single-phase B2T, BT, BT2, B4T13 and BT4 thick films were prepared by laser CVD.
► Microstructure of films corresponds to crystallographic features of each compound.
► Ti/Ba ratios for preparing each compound were consistent with equilibrium diagram.
► High-speed deposition of Ba–Ti–O thick films was archived using laser CVD.