The effect of Cs+ ions on codeposition of SiC particles with nickel

Electrodeposition of SiC particles (technical powder) with nickel matrix in the presence of cesium ions (0–37.6 mM) was investigated. The influence of Cs+ concentration on cathodic polarization curves was determined in galvanostatic and potentiodynamic measurements. The presence of Cs+ in the solution enhanced in some extent adsorption of Ni2+ ions on SiC, but preferential cesium adsorption occurred simultaneously. The last phenomenon resulted in cesium incorporation in the composite coating. The particle content in the deposits (16–24 vol%) was governed by the amount of nickel ions adsorbed on SiC. Structure of the composite coatings was studied by microscopic observations. At highest Cs+ concentrations, incorporation of small SiC grains was inhibited. Microhardness of deposits (390–800 HV) was directly dependent on the SiC content in the coatings.

Research highlights
► The papers describes electrodeposition of SiC particles with nickel matrix in the presence of cesium ions.
► Correlations among the Cs+ concentration in the bath, kinetics of the cathodic process, SiC content in the deposits as well as adsorption of Ni2+ ions on SiC were found.
► Microhardness of the Ni/SiC deposits was also determined.