Effect of substrates on phase formation in PMN-PT 68/32 thin films by sol–gel process

PMN-PT 68/32 thin films have been prepared on Pt/Si, ITO coated glass, stainless steel and silicon substrates in the identical processing conditions by sol–gel process. Annealing temperature of 600 °C was ascertained by thermo gravimetric analysis (TGA) study of the dried sol–gel powder of PMNT-PT 68/32 composition. X-ray diffraction (XRD) study showed ∼95% perovskite phase formation on Pt/Si and ITO coated glass substrates. SEM micrographs showed the formation of sub micron size grains on Pt/Si and ITO coated glass substrates. Diffuse phase transition with transition temperature (Tc) ∼190 °C was observed in 0.8 μm thick PMN-PT 68/32 films deposited on Pt/Si and ITO coated glass substrates.