کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1531546 | 995837 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of LiNbO3 thin films grown on Si substrate using magnetron sputter
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A RF magnetron sputter system was used to deposit lithium niobate (LiNbO3) thin films on (1 1 1)-oriented Si substrates. An optimal sputtering condition with RF power of 100 W, Ar/O2 ratio of 1 and substrate temperature of 575 °C was investigated. The smallest surface roughness of 6.0 nm for the deposited LiNbO3 was measured using atomic force microscopy. The crystallinity was examined by low angle X-ray diffractometer. Using the SOPRA GES5 spectroscopic ellipsometer, the associated refractive index and extinction coefficient as a function of wavelength were measured. High optical performance with crystallinity structure of the deposited LiNbO3 thin films was demonstrated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 136, Issue 1, 15 January 2007, Pages 92–95
Journal: Materials Science and Engineering: B - Volume 136, Issue 1, 15 January 2007, Pages 92–95
نویسندگان
Tsung-Hsin Lee, Fu-Tsai Hwang, Ching-Ting Lee, Hsin-Ying Lee,