کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1532261 | 1512023 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electric response as a function of applied voltage of Bi3.25La0.75Ti3O12 thin films grown by pulsed-laser deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
We have investigated the electrical properties of pulsed-laser deposited Bi3.25La0.75Ti3O12 (BLT) ferroelectric thin films. The obtained values of remanent polarization (2Pr) and coercive field (Ec) were 16 μC/cm2 and 84 kV/cm of BLT thin film, respectively. A strong low frequency dielectric dispersion (LFDD) has been observed above and below coercive voltage (Vc). A model was proposed to account for the observed phenomena, which fits very well to the dielectric dispersion relation: ε*=ε∞+iσ/ε0ω+(A{iω}n−1)/ε0ε*=ε∞+iσ/ε0ω+(A{iω}n−1)/ε0. The occurrence of an anomaly in n, σ, A, and ɛ∞ parameters near Vc indicates a coupling between the charge carriers and ferroelectricity.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 128, Issues 1–3, 15 March 2006, Pages 250–253
Journal: Materials Science and Engineering: B - Volume 128, Issues 1–3, 15 March 2006, Pages 250–253
نویسندگان
Jong-Ho Park, Jeong-Bae Kim,