Progress and applications of cluster ion beam technology

Cluster ion beam processing has been extensively developed during the 25 years since the concept originated. Low energy surface interaction effects, lateral sputtering phenomena and high-rate chemical reaction effects have been explored experimentally and have been explained by means of molecular dynamics (MD) modeling. Practical production equipment for a wide range of applications has also been successfully developed. The technology is now advancing rapidly in the fields of sub-nanoscale processing of metals, semiconductors and insulating materials. This paper reviews important events which have taken place during the development with emphasis placed on emerging new advances which have occurred during several recent years.