کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1564083 999632 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Molecular dynamics study of velocity distribution and local temperature change during rapid cooling processes in excimer-laser annealed silicon
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مکانیک محاسباتی
پیش نمایش صفحه اول مقاله
Molecular dynamics study of velocity distribution and local temperature change during rapid cooling processes in excimer-laser annealed silicon
چکیده انگلیسی
Molecular dynamics (MD) simulations have been performed to investigate velocity distribution of atoms and local temperature changes during rapid cooling processes in excimer-laser annealed Si. The interatomic forces were calculated using the Tersoff potential, and the rapid cooling processes were simulated by determining the atomic movements with a combination of Langevin and Newton equations using a MD cell with the size of 48.9 × 48.9 × 97.8 Å3. The local velocity distribution during rapid cooling processes was found to be the Maxwell-Boltzmann type, and the steady-state temperature distribution was obtained within 100 ps.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Computational Materials Science - Volume 37, Issue 3, September 2006, Pages 198-202
نویسندگان
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