کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1571834 | 1000656 | 2009 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of retrogression temperature and time on the mechanical properties and exfoliation corrosion behavior of aluminium alloy AA7150
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Influence of retrogression temperature and time on the mechanical properties and exfoliation corrosion behavior of aluminium alloy AA7150 Influence of retrogression temperature and time on the mechanical properties and exfoliation corrosion behavior of aluminium alloy AA7150](/preview/png/1571834.png)
چکیده انگلیسی
The tensile properties, exfoliation corrosion behavior and microstructures of the retrogression and re-aging (RRA) treated aluminum (Al) alloy AA7150 were studied. AA7150 was retrogressed at different temperatures (175 °C, 185 °C and 195 °C) for various times. It is found that as the hardness of the retrogressed AA7150 approaches the near-peak condition, the corresponding RRA treated AA7150 possesses good exfoliation corrosion resistance without strength loss. By retrogressing at 175 °C, the retrogression time can be extended to 3 h, the RRA treated AA7150 possesses a strength as high as that of conventional AA7150-T6, and its exfoliation corrosion resistance is in the vicinity to that of AA7150-T73. This enhanced exfoliation corrosion resistance was associated with the more separated η precipitates at the grain boundary. AA7150-T6 is mainly strengthened by fine GP zones with high number density, while the intra-grain micro-structure of AA7150-RRA retrogressed at 175 °C for 3 h is characterized by relatively coarse ηⲠprecipitates.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Characterization - Volume 60, Issue 11, November 2009, Pages 1334-1341
Journal: Materials Characterization - Volume 60, Issue 11, November 2009, Pages 1334-1341
نویسندگان
J.F. Li, N. Birbilis, C.X. Li, Z.Q. Jia, B. Cai, Z.Q. Zheng,