کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1584051 1514895 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering
چکیده انگلیسی

Titanium (Ti) films of thickness in the range of 101–254 nm were prepared onto glass and silicon substrates by direct current magnetron sputtering method. The effect of thickness on the electrical, structural, optical and surface properties of the films was studied. The room temperature sheet resistance decreased from 14.3 to 3.6 Ω/□ and the temperature coefficient of resistance value increased from 0.14 to 0.20% K−1 with increase in the thickness of the film. The optical and surface composition characteristics of the films were least influenced by the thickness. The films of all thickness exhibited hexagonal closed packed crystalline structure with predominant (0 0 2) crystallite orientation and an additional (1 0 0) orientation particularly in the films of thickness in the range of 153–205 nm. The average particle size in the films varied from 9 to 40 nm with the thickness.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 458, Issues 1–2, 15 June 2007, Pages 361–365
نویسندگان
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