کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1584907 | 1514910 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Thermal stability and grain growth behavior of nanocrystalline Mg2Si
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Thermal stability and grain growth behavior of nanocrystalline Mg2Si (nano-Mg2Si), prepared by using mechanically activated solid-state reaction plus hot-pressing in vacuum, were investigated by the method of in situ high-temperature X-ray diffraction. The result indicates that the evolution of grain size d with isothermal-annealing time t for nano-Mg2Si can be well described by the formula d − d0 = ct1/n with grain growth exponent n = 6, 5 and 4 at 700, 800 and 900 °C, respectively, indicating that nano-Mg2Si has a good thermal stability. Simultaneously, an Arrhenius plot of rate constant c against the reciprocal of T yields a straight line, from which an activation energy of 112 ± 1 kJ/mol is derived for the grain growth of nano-Mg2Si.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 434, Issues 1–2, 25 October 2006, Pages 166–170
Journal: Materials Science and Engineering: A - Volume 434, Issues 1–2, 25 October 2006, Pages 166–170
نویسندگان
L. Wang, X.Y. Qin, W. Xiong, L. Chen, M.G. Kong,