کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1585365 | 1514915 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Pulsed laser deposition of hydroxyapatite thin films under Ar atmosphere
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
This study was aimed at the pulsed laser deposition of hydroxyapatite (HA) thin films onto Ti substrate using KrF excimer laser. The deposition was carried out under an atmosphere of Ar at 45 Pa. The films structures have been analyzed by EPMA, TEM, XRD and Raman spectroscopy. It can be observed that the films are mainly composed of droplet-like particles which size of 0.2–2 μm. The results of XRD, TEM and Raman spectroscopy show that the films are amorphous. The ratio of Ca/P is 1.97, which is higher than that of HA. After heat treatment the XRD pattern show that the films were consist of HA and TiO2. The ratio of Ca/P is 1.82, which is close to that of crystalline HA.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 429, Issues 1–2, 15 August 2006, Pages 25–29
Journal: Materials Science and Engineering: A - Volume 429, Issues 1–2, 15 August 2006, Pages 25–29
نویسندگان
Quanhe Bao, Chuanzhong Chen, Diangang Wang, Tingquan Lei, Junming Liu,