کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1586033 | 1514926 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A study of the stress and resistivity of Al/Ti films deposited by an ion beam assisted process for surface acoustic wave devices applications
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A highly textured Al/Ti films were deposited on 128° Y–X LiNbO3 substrates by ion beam assisted deposition. Influence of low energy Ar ion beam bombardment on the residual stress and resistivity of the Al/Ti films was investigated. It was found that the residual stress of the Al/Ti films varied from tensile to compressive with increases in ion energy or flux. The films fabricated at 0.5 keV and 3 μA/cm2 possessed zero residual stress. An increase in the compressive stress resulted in a decrease in resistivity. By controlling the ion incident energy and flux, we were able to control the film stress and resistivity that were related to the reliability of SAW devices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 418, Issues 1–2, 25 February 2006, Pages 218–222
Journal: Materials Science and Engineering: A - Volume 418, Issues 1–2, 25 February 2006, Pages 218–222
نویسندگان
D.M. Li, X.B. Wang, F. Pan,