Arc discharge boron nitrogen doping of carbon nanotubes

This article describes the significant roles of process parameters in the deposition of boron and nitrogen co-doped multi-walled carbon nanotubes via the arc-discharge process. The fabrication process is based on the vaporization of solid hexagonal boron nitride embedded in graphite cylinders in a nitrogen atmosphere with pressure varying from 350 mbar to 700 mbar and controlled current density between 150 and 420 A/cm2. Our results show the presence of significant amount of doped boron carbon nitride nanotubes in the cathodic deposit. These nanotubes have a narrow diameter distribution (20–30 nm) and a length up to 1 μm as analyzed by scanning electron microscopy and transmission electron microscopy. In addition to the experimental study, numerical simulations were performed to determine the temperature and chemical species distributions in the arc plasma under specific boron carbon nitride nanotubes synthesis conditions, thereby providing valuable insight into nanotubes growth and doping mechanisms in the arc.