کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1593047 1002683 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory
چکیده انگلیسی

In this communication the electrical characteristics of poly(methylsilsesquioxane) (PMSSQ) thin films and the possibility of charge storage in the Au nanoparticle embedded PMSSQ film base memory element have been studied. PMSSQ films were sandwiched between Al and Si electrodes to fabricate metal–polymer–semiconductor (MPS) structures. The conduction mechanism in PMSSQ films has been investigated. The charge transport mechanism appears to be space charge limited current (SCLC) at the higher-voltage region. Various electrical parameters such as reverse saturation current, barrier height, ideality factor, rectification ratio, shunt and series resistance and charge carrier mobility in PMSSQ have been determined. C–VC–V analysis is performed to confirm the memory effect for Au nanoparticles embedded MPS structures. A definite clockwise hysteresis is observed which indicates the possibility of charge storage in the Au nanoparticles embedded PMSSQ film.

Research highlights
► Au NP based non-volatile memory.
► The charge transport phenomenon.
► Electrical parameters and charge carrier mobility

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 151, Issue 4, February 2011, Pages 297–300
نویسندگان
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