کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1593993 1515652 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dislocation-induced composition profile in alloy semiconductors
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Dislocation-induced composition profile in alloy semiconductors
چکیده انگلیسی

We present a novel computational method by combining the finite element method and the method of moving asymptotes to study the dislocation-induced composition profile in alloy semiconductors. Segregated cylindrical nanoscale regions appear around the dislocation core. We find that the dominant driving force of non-uniform composition is strain contribution. Moreover, the method can be applied to the dislocated nanoscale heterostructures which are inaccessible by atomic treatment.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 150, Issues 29–30, August 2010, Pages 1275–1278
نویسندگان
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