The performance of Pt bottom electrode and PZT films deposited on Al2O3 /Si substrate by using LaNiO3 film as an adhesion layer

A (110) preferred Pt electrode by using a (100)-oriented conductive oxide electrode LaNiO3 film as an adhesion layer on a γγ- Al2O3 (100)/Si substrate has been deposited by RF magnetron sputtering. It was found that the phase instability of LaNiO3 almost has no effect on the (110)-orientated Pt growth. Highly (110)-textured Pb(Zr0.40Ti0.60)O3 films can been achieved when it was deposited on the (110) preferred Pt bottom electrode. The as-grown Pb(Zr0.40Ti0.60)O3 films possesses excellent dielectric, ferroelectric and pyroelectric properties. The results indicate that the Pt/LNO/γ- Al2O3/Si substrate is attractive for depositing highly (110)-orientated ferroelectric films with perovskite structure and the highly (110)-orientated Pb(Zr0.4Ti0.60)O3 films are promising for sensor and actuator applications.