کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1596659 1002839 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Statistical appearance of nonuniform fluctuations in a wide-gap n+-n−-n-n+ device
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Statistical appearance of nonuniform fluctuations in a wide-gap n+-n−-n-n+ device
چکیده انگلیسی
A cross-correlation matrix applied for restoring the doping profile in an n+-n−-n-n+ device was reported recently [Y.-H. Shiau, Solid-State Electron. 50 (2006) 191]. In this paper we will show that this statistical method is very useful for detecting the dynamical processes embedded in semiconductor devices. In addition, extraction of nonuniform fluctuations hidden in this wide-gap semiconductor device could be helpful for clarifying the previous studies on several competing instabilities in InSb at 77 K [A. Čenys, G. Lasiene, K. Pyragas, Solid-State Electron. 35 (1992) 975; H. Ito, Y. Ueda, Phys. Lett. A 280 (2001) 312]. A general discussion about the application of the cross-correlation matrix to other pattern-forming systems is also given in the present study.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 139, Issue 6, August 2006, Pages 278-283
نویسندگان
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