Deposition of multicomponent metallic glass films by single-target magnetron sputtering

Multicomponent metallic glass films inheriting the superior mechanical properties and wide supercooled liquid regions of their bulk counterparts attract increasing attentions for applications in micro-electro-mechanical systems and nano-devices. In this paper, we systematically investigated the growth of multicomponent metallic glass films synthesized using single-target magnetron sputtering. It was found that the working argon gas pressures (PAr,) and sputtering power are two key factors governing film growth and composition. At high PAr, the glassy films grow via a columnar mode, leading to rough film surface. At low PAr, the films exhibit a negative growth exponent and a nearly atomically flat surface. At appropriate sputtering power and PAr, the films can completely inherit the composition of alloy targets, which makes it possible to fabricate multicomponent glassy films with controllable composition using single targets. The mechanisms accounting for the growth of the glassy films are discussed in the framework of dynamic scaling theory. The diversely tunable film microstructure and composition are expected to lead metallic glasses towards new functional applications.

The surface profile of the metallic glass films deposited under different sputtering conditions showing peak-to-valley roughness ranging from 20 nm down to 1 nm.Figure optionsDownload as PowerPoint slideHighlights
► Multicomponent films with tunable compositions are deposited by a single-target.
► The film growth modes depend on sputtering conditions.
► The surface roughness can be tailored from ∼20 nm down to nearly atomically flat.
► The target microstructures do not affect the film composition and growth mode.