کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1604409 1516007 2009 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
α-Alumina coatings on WC/Co substrates by physical vapor deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
α-Alumina coatings on WC/Co substrates by physical vapor deposition
چکیده انگلیسی

Physical vapor deposition coatings for cutting tools may be deposited by, e.g. reactive magnetron sputtering. Alumina growth in Ar/O2 gas mixtures gives rise to problems due to insulating layers on targets, and hysteresis effects with respect to oxygen gas flow. In this paper is described a technology for the deposition of crystalline alumina: reactive high power impulse magnetron sputtering. Pure Al was used as target material, and the cemented carbide (WC/Co) substrates were kept at 500–650 °C. Hysteresis effects with respect to oxygen gas flow were alleviated, which enabled stable growth at a high deposition rate. The high power impulses were helpful in obtaining a crystalline oxide coating. X-ray diffraction and cross-section transmission electron microscopy showed that α-alumina films were formed. Technological testing of these PVD alumina coatings, with state-of-the-art AlTiN as benchmark, showed significantly improved crater wear resistance in steel turning.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Refractory Metals and Hard Materials - Volume 27, Issue 2, March 2009, Pages 507–512
نویسندگان
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