کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1604710 | 1516020 | 2006 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Magnesium interlayered diamond coating on silicon
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Diamond thin films have been deposited using hot filament chemical vapour deposition technique on manually scratched p-Si(1 0 0) substrate, with and without magnesium interlayer. In spite of magnesium melting point being lower (Tm = 649 °C) than the growth temperature of the substrate (Ts â¼Â 750 °C) used in these experiments, it was found that high quality diamond films could be grown on Mg covered substrate. A liquid substrate is probably generated during the diamond film growth. Raman spectroscopy analysis exhibited only the triply degenerate, zone centre optical phonon peak at 1333 cmâ1 indicating that nearly stress free crystallites were present. Broadening of the Raman peak (â¼11.76 cmâ1) indicates that some small crystallites also are present. Scanning electron and atomic force microscopy accompanied by X-ray diffraction analysis where used to compare the details of diamond film growth directly on scratched Si(1 0 0) and Mg interlayered scratched Si(1 0 0) substrates.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Refractory Metals and Hard Materials - Volume 24, Issue 6, November 2006, Pages 418-426
Journal: International Journal of Refractory Metals and Hard Materials - Volume 24, Issue 6, November 2006, Pages 418-426
نویسندگان
M.A. Dar, S.G. Ansari, Z.A. Ansari, Hironobu Umemoto, Young-Soon Kim, Hyung-Kee Seo, Gil-Sung Kim, Eun-Kyung Suh, Hyung-Shik Shin,