Microstructural and mechanical properties of magnetron sputtered SiOxNy thin films

Silicon oxynitride (SiOxNy) films were deposited over the Ni-plated steel by reactive radio frequency (RF) magnetron sputtering technique by varying the oxygen partial pressure. As-deposited films were characterized using the X-ray diffractometer (XRD) and field-emission scanning electron microscopy (FE-SEM) to study the structural and morphological properties. The grain size obtained from the XRD pattern and the FE-SEM were in good agreement. The hardness of the film increases with increase in the oxygen partial pressure. The sample deposited at high oxygen partial pressure showed the decreased hydrophobic nature.