Manufacturing of Annular Targets Made of LEU Foil Coated with Electrodeposited Nickel

The results achieved in the development of an annular target manufacturing technology for Mo-99 radioisotope production, with targets containing a low enriched uranium LEU foil, are presented in this paper. The paper describes the annular targets manufacture comprising the uranium foil and a thin layer of nickel obtained by electroplating on the surface of the uranium, resulting in Ni deposits with thickness of 15 to 25 microns. It was necessary to determine the potential to avoid the presence of uranium oxide and also to determine the intensity (amperage) at which its formation begins. The results obtained, showed that the mass of Ni deposited on the uranium foil is proportional to the electroplating time and the current intensity. Ultrasonic Tests and Screen Electronic Microscopy revealed good bonding and homogeneity of the nickel deposit. The Ni layer had a high hardness and a relatively small grain size with an orientation in the direction of the electrical current flow.