کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1634180 | 1516777 | 2015 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural Analysis of ZnO(:Al,Mg) Thin Films by X-ray Diffraction
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Transparent conductive oxides are widely studied materials for photovoltaics and sensing systems. ZnO possesses excellent transparency and high electron mobility. In this work, we have studied the effect of Al and Mg dopants and their influence on the structural and electrical characteristics of ZnO films. A sol-gel route was used to obtain the intrinsic and doped ZnO precursor solutions. Subsequently, we have deposited the material on glass substrates by spray pyrolysis and, finally, the films were characterized by X-ray diffraction measurements to determine parameters like the lattice parameter, the preferential growth orientation and the mosaicity in the layers.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Procedia Materials Science - Volume 8, 2015, Pages 551-560
Journal: Procedia Materials Science - Volume 8, 2015, Pages 551-560